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Growth instability due to lattice-induced topological currents in limited mobility epitaxial growth models

机译:由于晶格诱导的拓扑电流导致的生长不稳定性   有限迁移率外延生长模型

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摘要

The energetically driven Ehrlich-Schwoebel (ES) barrier had been generallyaccepted as the primary cause of the growth instability in the form ofquasi-regular mound-like structures observed on the surface of thin film grownvia molecular beam epitaxy (MBE) technique. Recently the second mechanism ofmound formation was proposed in terms of a topologically induced flux ofparticles originating from the line tension of the step edges which form thecontour lines around a mound. Through large-scale simulations of MBE growth ona variety of crystalline lattice planes using limited mobility, solid-on-solidmodels introduced by Wolf-Villain and Das Sarma-Tamborenea in 2+1 dimensions,we propose yet another type of topological uphill particle current which isunique to some lattice, and has hitherto been overlooked in the literature.Without ES barrier, our simulations produce spectacular mounds very similar, insome cases, to what have been observed in many recent MBE experiments. On alattice where these currents cease to exist, the surface appears to bescale-invariant, statistically rough as predicted by the conventional continuumgrowth equation.
机译:通过分子束外延(MBE)技术生长的薄膜表面上以准规则的丘状结构的形式,以能量驱动的Ehrlich-Schwoebel(ES)屏障已被普遍认为是生长不稳定的主要原因。最近,根据由拓扑边缘引起的颗粒的通量提出了第二种形成丘的机理,所述颗粒的通量源自形成在丘周围的轮廓线的台阶边缘的线张力。通过使用有限的迁移率,Wolf-Villain和Das Sarma-Tamborenea在2 + 1维上引入的固体对固体模型,通过在各种晶格平面上的MBE生长的大规模模拟,我们提出了另一种拓扑上坡粒子流在某些情况下,没有ES障碍,我们的模拟产生的壮观土丘与许多最近的MBE实验中观察到的十分相似。在这些电流不再存在的晶格上,表面似乎是尺度不变的,如常规连续增长方程所预测的,在统计学上是粗糙的。

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